The Litho Spin Cup 800C is a high-precision, multi-function manual spin coater that can be customized for each semiconductor device manufacturing process, covering a range of products from chemically amplified resists to thick-film resists.
The Litho Spin Cup 800C is widely used for numerous applications, including the production of diverse types in small quantities, device development in research institutions, process evaluations by semiconductor equipment manufacturers, material evaluations by chemical manufacturers and substrate manufacturers, and condition settings and materials selection by device manufacturers.

Just as with an automatic equipment, the number of discharge lines can be specified. The system comes with an edge bead remover (EBR), back side rinse (BSR), and automatic exhaust damper. Various other options are also available depending on the application, including resist temperature control, fan filter unit, chemical filter, and temperature and humidity control of the atmosphere inside the coating chamber. The system can handle various substrate sizes from small irregularly shaped substrates up to φ450-mm wafers.

The Litho Spin Cup 800D is a manual spin developer that supports various development methods. Available models include organic development models.

The programmable swing arm and various nozzle types, including a stream nozzle, slit nozzle, and spray nozzle, enable development and rinsing for specific applications.

The Litho Spin Cup 1200C coater accommodates wafers up to 300 mm. The product line also includes the Litho Spin Cup 450C, which supports 450-mm wafers.

The Litho Spin Cup 1200D is a 300-mm wafer developer capable of handling development methods for various processes.

It makes it easier to set conditions that control the line width of resist patterns and improve in-plane line width uniformity on 300-mm wafers. It’s used for research and development and to produce a range of devices in small quantities.

The Litho Spin Cup 200C is a low-cost, compact, manual resist coater that makes hand dispensing easy for experiments and development. It's also compatible with automatic dispensers.

The Litho Spin Cup 200D is a manual alkaline developing equipment that automatically performs paddle development and rinsing conveniently and safely after the wafer is mounted.