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Coating / Developing / Baking
Automated | Coating / Developing
Manual | Coating / Developing
Manual | Baking
For single wafer / Batch type | Primer depo.
Resist property analyzer
Resist development analysis
Exposure
Resist evaluation | measurement
Measurement & Evaluation service
System for nanoimprint evaluation
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Coater & Developer
Automated resist coating /developing / baking equipment
LITHOTRAC series
LITHOTRAC Dual-1000
LITHOTRAC CB-50
LITHOTRAC DB-50
Manual resist coating / developing Equipment
Litho Spin Cup series
Litho Spin Cup 800C
Litho Spin Cup 800D
Litho Spin Cup 1200C
Litho Spin Cup 1200D
Litho Spin Cup 200C
Litho Spin Cup 200D
Manual baking / cooling equipment
LWB series
LWB-03/LWB-03H
LWB-03P
Manual HMDS baking equipment
APPS series
APPS-30
Resist evaluation system
Resist development analyzer
RDA series
RDA-760
RDA-760Spin
RDA-790
RDA-800
RDA-800Twin
RDA-Qz3
Photo-process analysis equipment
UVES-2000
UVES-2500
ArFES-3000
EBES-6000
EUVES-7000
EUVES-9000
EUVOM-9000
LUVC-5000
Resist evaluation tool
PAGA-100
ProxSim II
Mask aligner
Currently discontinued
Photo mask
Mask for semiconductor exposure equipment
Contact to Benchmark Technologies directly
Phase Shift Focus Monitor Reticle
Nanoimprint
Nanoimprint
LTNIP-500
Simulator
Virtual Lithography Simulator
PROLITH 2019b
ProDATA
Film thickness measurement equipment
Film thickness measurement equipment
Contact to Foothill Instruments directly
KV-300
KF-10
L-2
Spectroscopic ellipsometer
UNECS-2000/UNECS-3000
Si wafer thickness measurement equipment
Si-71
Foothill Si-71
EUV light source
EUV light source Contact to Energetiq Technology directly
EQ-10M、EQ-10HP
Consignment business for study and measurement
Consignment business for study and measurement
Measurement service
Research service
LDLS (Laser Driven Light Source)
Contact to Energetiq Technology directly
LDLS (Laser Driven Light Source)
Energetiq Technology
EQ-99X
EQ-99XFC
EQ-9, EQ-77, EQ-400