The RDA-760 measures resin development rates.
The RDA-760 is ideal for resin quality control.

Number of monitors:                   1 channel or 3 channels
Monitor wavelength:                   950nm
Applicable resist film thickness:   500nm to 10,000nm

 

Available the organic solvent as developer (option)

The RDA-760Spin measures resin development rates by spin development.
The RDA-760Spin is ideal for resin quality control.

Number of monitors:                   1 channel
Monitor wavelength:                   950nm
Applicable resist film thickness:   500nm to 10,000nm

The RDA-790 evaluates photoresist development rates.
It calculates γ values, contrast curves, surface inhibition parameters, and development parameters.

Number of monitors:                    18 channels
Monitor wavelength:                    950nm
Applicable resist film thickness:    500nm to 10,000nm

 

Available 470nm monitor wavelength light for measuring resist film thickness 100nm to 1,000nm  (option)

The RDA-800 evaluates photoresist development rates.
It calculates γ values, contrast curves, surface inhibition parameters, and development parameters.
The mechanism that immerses the wafer and lens synchronously into the developing solution supports high Rmax (5,000 nm/s) resists, including ArF resists.

Number of monitors:                   18 channels
Monitor wavelength:                   470nm and 950nm (dual type)
Applicable resist film thickness:    80nm to 10,000nm

 

Available the organic solvent as developer (option)

The RDA-800Twin evaluates photoresist development rates.
It calculates γ values, contrast curves, surface inhibition parameters, and development parameters.
The mechanism that immerses the wafer and lens synchronously into the developing solution supports high Rmax resists, including ArF resists.
In addition, it has two developing tanks that can hold alkaline and organic solvents separately.

Number of monitors:                    18 channels
Monitor wavelength:                    470nm and 950nm (dual type)
Applicable resist film thickness:    80nm to 10,000nm

 

Available 265nm monitor wavelength light for measuring resist film thickness 40nm to 200nm  (option)

The RDA-Qz3 which based on the quartz microbalance measurement (QCM) method as a principle of measurement allows to measure the mass changes of the resist at developing.
It is also possible to analyze the swelling behavior (thickness and viscosity of the swollen membrane) of resist films during development.

Number of monitors:           1 channel
QCM plate:                         5 MHz
Applicable film thickness:    10nm to 3,000nm