Lithography simulator allows to calculate the developed photo-resist shape by visualizing the imaging by exposure optical system and the process of development and photosensitive of photo-resist on the computer by each numerical calculation. Lithography simulators are essential for research, development, and production related to lithography.

KLA

ProDATA quickly and easily analyzes existing data, including contrast curves, swing curves, and focus exposure matrix (FEM) for measured and simulated data. It is possible to decide the process based on the analyzed results.

KLA